Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS
Yang, Jixin, Hyde, Jason R, Wilson, James W, Mallik, Kanad, Sazio, Pier, Brien, Paul, Malik, Mohamed A, Afzaal, Mohammad, Nguyen, Chinh Q, George, Michael W, Howdle, Steven M and Smith, David C (2009) Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS.
Full text not available from this repository.Abstract
Supercritical chemical fluid deposition (SCFD) has been shown to have remarkable advantages for deposition inside nanostructured templates however so far the technique has mostly been used to deposit metals. In this paper we present the SCFD of optoelectronic grade CdS. The quality of this material is demonstrated by a range of techniques including reflectivity (A) and photoluminescence spectroscopy (B and C). At 4 K the bandedge luminescence has a full-width-at-half-maximum linewidth of 30 meV comparable with that of single crystal CdS.
Item Type: | Article |
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Additional Information: | Metadata only available from this repository. © 2009 Wiley Publishing.This article was originally published in the Journal of Advanced Materials in 2009, by Wiley. The definitive version is available at http://dx.doi.org/10.1002/adma.200803751 |
Keywords: | CdS chalcogenide, continuous flow, semiconductors, supercritical fluids |
Divisions: | ?? GlyndwrUniversity ?? |
Depositing User: | ULCC Admin |
Date Deposited: | 05 Oct 2011 09:13 |
Last Modified: | 11 Dec 2017 20:05 |
URI: | https://wrexham.repository.guildhe.ac.uk/id/eprint/107 |
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